We manufacture advanced heat treatment equipment for production of power semiconductors, (Si, SiC, GaN), organic EL (OLED), MEMS, and VCSEL, as well as for Packaging (Fan-Out WLP/PLP, Wafer Bump, others). Our product lineup covers heat treatments from a low-temperature range to 1850°C. Multiple conditions can be selected when searching products.

A400 DUO is a batch vertical furnace for 200mm and smaller wafers, and focuses on applications in the markets for power, analog, RF, and MEMS devices. The A400 DUO furnace tool is capable of running low pressure CVD (LPCVD), as well as diffusion and oxidation applications.

Now KLL has designed again a special vertical furnace for low-k dielectric bake. The same type of LGO heating element is used also successfully since years in Kioyo Thermo Systems semiconductor tube furnaces for other typical low temperature processes like polyimide bake and hydrogen anneal.

This large-batch mass-production type vertical diffusion furnace can process a maximum of 100 wafers (300-mm / 12-inch) or 16 FOUPs a batch. An LGO heater is used for superior temperature characteristics from low temperatures to medium high temperatures.

The fabrication of a semiconductor is often achieved using an industrial furnace; this blog post will outline how this process works. Semiconductor Device Fabrication. Semiconductor fabrication is a multi-step sequence of chemical processing and photo lithographic steps, where the electronic circuit is created on a wafer.

Diffusion furnaces exploit a complex form of advanced thermal processing to assist the upward trajectory of the semiconductor industry. Since the invention of the silicon (Si) transistor and subsequently the integrated circuit (IC) in the 1950s, the semiconductor market has grown into a new titan of industry worth more than $400 billion.

Vertical furnaces are used for processing wafers during semiconductor device manufacturing—including for film formation, annealing, and resin film hardening. These batch processing furnaces feature a vertically arranged quartz tube that heats objects placed around the tube for processing.

Discover how semiconductor furnaces ensure precise temperature control critical for oxidation, diffusion, annealing, and deposition processes. Learn about the importance of predictive maintenance and continuous monitoring with vibration sensors to prevent downtime and maintain wafer purity levels.

SONORA is a 300mm batch vertical furnace for logic/foundry and memory applications, as well as 300mm analog/power. SONORA is capable of both atmospheric and low-pressure thermal wafer processing.

Semiconductor furnaces for diffusion, oxidation, doping, and other processes in wafer and cell manufacturing (4”, 6”, 8” and 12” wafers).