A typical optical system for lithography contains 11 components ... many have started thinking about the next step. The first decade following the introduction of high-volume EUV lithography ...

However, it faces limitations such as diffraction and scattering of light, which set bounds on the minimum feature size that can be achieved. Advanced techniques like extreme ultraviolet (EUV) ...

For the first commercial demonstrations of EUV lithography, EUV mask fabrication will use many of the same process steps as for optical masks and re-use much of the existing advanced mask shop ...

This is a slow process compared to optical lithography, as used in mass production ... which he used to make these beautiful images. The first step is to coat a wafer with a layer of e-beam ...

Paper-thin optical ... few straightforward steps using industry standard machinery. "We developed a simple and mass-producible method for FZPs using a common semiconductor lithography system ...