Semiconductor Engineering1 天
Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Understand LWR ...
A new technical paper titled “Controlling Speckle Contrast Using Existing Lithographic Scanner Knobs to Explore the Impact on ...
scmp.com4 个月
China’s chip-making sees steady progress with new tools, but nothing to rival ASML
The other system uses a more advanced argon fluoride (ArF) light source with a 193nm wavelength and an overlay accuracy below 8nm, supporting a production resolution of 65nm on 12-inch wafers.
IEEE1 年
D. J. Colon
Advantages Of Cost,Argon Fluoride,Consumption Cost,Deep Ultraviolet,Energy Output,First Pass,Gain Medium,Gas Mixture,High Power,High Pulse Energy,Lens Design,Light ...
IEEE11 个月
A. J. Schmitt
Confinement Fusion,Inertial Confinement,Inertial Confinement Fusion,Naval Research Laboratory,Amplified Spontaneous Emission,Argon Fluoride,Calorimeter,Deep ...
Semiconductor Packaging News4 个月
China's lithography gains a glass half full, not half empty
China's Ministry of Industry and Information Technology added two domestically-made lithography systems, a krypton fluoride (KrF) and argon fluoride (ArF) scanner, to its equipment adoption list, ...
阿思達克財經網4 个月
CN Develops DUV Lithography Machine Capable of Producing Chips of 8nm and Below
The list of electronic special equipment includes deep ultraviolet (DUV) lithography equipment called "argon fluoride lithography machine," with core technical specifications of "300mm wafer ...